Get Android Application Development for the Intel Platform PDF

By Ryan Cohen, Tao Wang

ISBN-10: 1484201019

ISBN-13: 9781484201015

The variety of Android units working on Intel processors has elevated on account that Intel and Google introduced, in past due 2011, that they might be operating jointly to optimize destiny types of Android for Intel Atom processors. this day, Intel processors are available in Android smartphones and drugs made through a number of the most sensible brands of Android units, resembling Samsung, Lenovo, and Asus.

The bring up in Android units that includes Intel processors has created a requirement for Android purposes optimized for Intel structure: Android program improvement for the Intel® Platform is the proper advent for software program engineers and cellular app builders. via well-designed app samples, code samples and case reviews, the ebook teaches Android program improvement according to the Intel platform—including for smartphones, pills, and embedded devices—covering functionality tuning, debugging and optimization.

This ebook is together built for person studying by way of Intel software program collage and China Shanghai JiaoTong University.

What you’ll learn

Comprehensive advent to the Intel ® Embedded and cellular platform
Android app GUI layout rules and guidelines
Covers the most recent Intel Android improvement instruments, together with Intel Beacon Mountain model 0.6 and the Intel Compiler
NDK and C/C++ optimization
Designing and optimizing for low-power consumption
Who this ebook is for

The e-book is basically for app builders, software program engineers and open-source programming fans, yet is usually utilized by for education courses and Codeacademy-style courses.

Show description

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Miele, A. Brioude, D. Cornu, Fabrication of silicon pyramid/nanowire binary structure with superhydrophobicity. Appl. Surf. Sci. P. Lee, S. Choi, S. Park, Extremely superhydrophobic surfaces with micro- and nanostructures fabricated by copper catalytic etching. Langmuir. Y. He, C. Jiang, H. Yin, J. Chen, W. Yuan, Superhydrophobic silicon surfaces with micronano hierarchical structures via deep reactive ion etching and galvanic etching. J. Colloid Interface Sci. W. Wang, D. Li, M. C. Lee, R. Yang, Wafer-scale fabrication of silicon nanowire arrays with controllable dimensions.

Tang, X. Yang, Constructing thin polythiophene film composed of aligned lamellae via controlled solvent vapor treatment. Langmuir. S. Tian, L. Li, W. Sun, X. Xia, D. Han, J. Li, C. Gu, Robust adhesion of flower-like few-layer graphene nanoclusters. Sci. Rep. K. Ijichi, A. Fukuoka, A. Shimojima, M. Sugiyama, T. Okubo, A combined top-down and bottom-up approach to fabricate silica films with bimodal porosity. Mater. Lett. Y. Xiu, L. W. P. Wong, Hierarchical silicon etched structures for controlled hydrophobicity/superhydrophobicity.

Gas flow, platen power, time ratio of etching and passivation (E/P), and total cycles. 4 Formation of nanostructures by an improved maskless DRIE process. a Schematic illustration. 1. Lots of comparative experiments show that the formation of nanostructures tightly correlates with the gas flow, which directly determines the working range of DRIE process. While other parameters, including total cycles, platen power, and E/P, have the significant influence on the profile of nanostructures. In summary, the gas flow controls the DRIE working range, while the other three parameters realize the controllable formation of nanopillar forest.

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Android Application Development for the Intel Platform by Ryan Cohen, Tao Wang


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